Determination of Residual Stress of PACVD Nanostructure TiN Coatings by GIXRD Method

Journal of Advanced Materials and Processing

مقاله 1، دوره 6، شماره 3، آذر 2018، صفحه 3-12   

نوع مقاله: Research Paper

نویسندگان

Mahdi Raoufi^{* 1}؛ A. Zolanvari²؛ Majid null zarezadeh³

¹Department of Materials Science and Engineering, Faculty of Engineering, Arak University, Arak 38156-8-8349, Iran

²b Department of Physics, Faculty of Science, Arak University, Arak, Iran.

³a Department of Materials Science and Engineering, Faculty of Engineering, Arak University, Arak 38156-8-8349, Iran.

چکیده

In this study, thin layers of titanium nitride (TiN) were deposited on H13 steel substrates at different duty cycles and temperature of 520 ˚C using plasma assisted chemical vapor deposition (PACVD). Uniaxial residual stress was calculated by X-ray diffraction (XRD) and Sin2 Ψ method. Then the residual stress of the samples were measured by Grazing Incidence X-ray Diffraction (GIXRD) method and lattice parameter diagrams versus f(Ψ). Depth of penetration and texture coefficient in the samples were also evaluated. The surface morphology was examined using field-emission gun scanning electron microscope (FESEM) and the relationship of the stress and micro hardness test was also expressed. The results showed that by reducing duty cycles, residual stress decreases as well as with more changes of the lattice parameter, more changes of residual stress will be seen. Also, the microstructure result was in good agreement with theory and clearly displayed spherical morphology and uniform distribution of the created phases

کلیدواژه‌ها

TiN؛ plasma assisted chemical vapor deposition؛ residual stress؛ GIXRD